| 摘要 |
Provided is a photocurable composition, which is capable of forming a cured product having excellent environmental properties and mold release performance and has excellent compatibility with fluorosurfactants and other components. Also provided is a method with which it is possible to produce a molded article having a surface micropattern obtained by precise transfer of a mold inverted pattern and having a uniform surface composition. A photocurable composition for imprinting comprises as the primary component a compound having one or more acryloyloxy or methacryloyloxy groups. The photocurable composition contains polymer (D). Polymer (D) is a polymer having a mass-average molecular weight of 1,000 to 5,000 and contains 20 to 45 mass% of CH2=C(R11)-C(O)O-Q-Rf units, 20 to 65 mass% of CH2=C(R21)-C(O)O-(CH2CH(R22)O)n-H units (number-average molecular weight of 350 or less), and 5 to 40 mass% of CH2=C(R31)-C(O)O-R32 units. R11, R21, and R31 are hydrogen atoms or methyl groups, Q is a bivalent linking group, or the like, Rf is a C1-6 polyfluoroalkyl group, R22 is a hydrogen atom, or the like, n is between 3 and 6, and R32 is a C2-15 aliphatic hydrocarbon group.
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