| 发明名称 |
POST-DEPOSITION SOFT ANNEALING |
| 摘要 |
<p>PURPOSE: A post-deposition soft annealing method is provided to reduce internal stress in silicon layers by performing a soft annealing process. CONSTITUTION: A wafer is mounted on a susceptor. The susceptor is supported on a susceptor supporter. A susceptor position controller (402) rotates the wafer. A heat control mechanism (403) controls heat sources. A gas flow controller (405) controls a gas flow.</p> |
| 申请公布号 |
KR20130114008(A) |
申请公布日期 |
2013.10.16 |
| 申请号 |
KR20130037724 |
申请日期 |
2013.04.05 |
| 申请人 |
NOVELLUS SYSTEMS, INC. |
发明人 |
FOX KEITH;VAN SCHRAVENDIJK BART J.;NIU DONG;HENDERSON LUCAS B.;WOMACK JOSEPH L. |
| 分类号 |
H01L21/8247;H01L21/205;H01L27/115 |
主分类号 |
H01L21/8247 |
| 代理机构 |
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