发明名称 |
VAPORIZING APPARATUS AND FILM FORMING APPARATUS PROVIDED WITH VAPORIZING APPARATUS |
摘要 |
Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately. |
申请公布号 |
EP2154711(B1) |
申请公布日期 |
2013.10.16 |
申请号 |
EP20080752777 |
申请日期 |
2008.05.15 |
申请人 |
KABUSHIKI KAISHA WATANABE SHOKO;TODA, MASAYUKI |
发明人 |
TODA, MASAYUKI;KUSUHARA, MASAKI;UMEDA, MASARU;FUKAGAWA, MITSURU |
分类号 |
H01L21/205;C23C16/448 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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