发明名称 Semiconductor device including bottom surface wiring and manfacturing method of the semiconductor device
摘要 Disclosed herein is a semiconductor device including a semiconductor substrate, a wiring layer formed above the semiconductor substrate, a through-hole electrode extending from the bottom surface of the semiconductor substrate to the wiring layer, a bottom surface wiring provided at the bottom surface of the semiconductor substrate such that the bottom surface wiring is connected to the through-hole electrode, and an external terminal connected to the bottom surface wiring. The bottom surface wiring has a greater film thickness than a film thickness of the through-hole electrode at least a portion of the bottom surface wiring including a connection part between the bottom surface wiring and the external terminal.
申请公布号 US8558387(B2) 申请公布日期 2013.10.15
申请号 US20100926178 申请日期 2010.10.29
申请人 KATO OSAMU;LAPIS SEMICONDUCTOR CO., LTD. 发明人 KATO OSAMU
分类号 H01L23/48;H01L23/52;H01L29/40 主分类号 H01L23/48
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