发明名称 Ruthenium for a dielectric containing a lanthanide
摘要 A gate containing ruthenium for a dielectric having an oxide containing a lanthanide and a method of fabricating such a combination gate and dielectric produce a reliable structure for use in a variety of electronic devices. A ruthenium or a conductive ruthenium oxide gate may be formed on a lanthanide oxide. A ruthenium-based gate on a lanthanide oxide provides a gate structure that can effectively prevent a reaction between the gate and the lanthanide oxide.
申请公布号 US8558325(B2) 申请公布日期 2013.10.15
申请号 US20100781649 申请日期 2010.05.17
申请人 AHN KIE Y.;FORBES LEONARD;MICRON TECHNOLOGY, INC. 发明人 AHN KIE Y.;FORBES LEONARD
分类号 H01L29/76 主分类号 H01L29/76
代理机构 代理人
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