发明名称 Non-planar device having uniaxially strained semiconductor body and method of making same
摘要 A method and a device made according to the method. The method comprises providing a substrate including a first material, and providing a fin including a second material, the fin being disposed on the substrate and having a device active portion, the first material and the second material presenting a lattice mismatch between respective crystalline structures thereof. Providing the fin includes providing a biaxially strained film including the second material on the substrate; and removing parts of the biaxially strained film to form a substantially uniaxially strained fin therefrom.
申请公布号 US8558279(B2) 申请公布日期 2013.10.15
申请号 US20100924232 申请日期 2010.09.23
申请人 CEA STEPHEN M.;KOTLYAR ROZA;KAVALIEROS JACK T.;GILES MARTIN D.;GHANI TAHIR;KUHN KELIN J.;KUHN MARKUS;ZELICK NANCY M.;INTEL CORPORATION 发明人 CEA STEPHEN M.;KOTLYAR ROZA;KAVALIEROS JACK T.;GILES MARTIN D.;GHANI TAHIR;KUHN KELIN J.;KUHN MARKUS;ZELICK NANCY M.
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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