SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to prevent contamination by applying reactive gases to the rear side of a substrate through a gas spray device. CONSTITUTION: A chamber includes a reactive space inside. A gas spray device (3) sprays reactive gases. A heater (4) heats a substrate. A substrate supporting ring (10) includes a substrate receiving part. The substrate receiving part receives the substrate to be separated from the heater.