发明名称 Methods of forming a phase change layer and methods of fabricating a phase change memory device including the same
摘要 A phase change structure includes a first phase change material layer pattern and a second phase change material layer pattern. The first phase change material layer pattern may partially fill a minute structure, and the second phase change material layer pattern may fully fill the minute structure. The first phase change material layer pattern may include a first phase change material, and the second phase change material layer pattern may include a second phase change material having a composition substantially different from a composition of the first phase change material.
申请公布号 US8557627(B2) 申请公布日期 2013.10.15
申请号 US201313752310 申请日期 2013.01.28
申请人 OH JIN-HO;PARK JEONG-HEE;KANG MAN-SUG;CHOI BYOUNG-DEOG;OH GYU-HWAN;PARK HYE-YOUNG;PARK DOO-HWAN;SAMSUNG ELECTRONICS CO., LTD. 发明人 OH JIN-HO;PARK JEONG-HEE;KANG MAN-SUG;CHOI BYOUNG-DEOG;OH GYU-HWAN;PARK HYE-YOUNG;PARK DOO-HWAN
分类号 H01L29/02 主分类号 H01L29/02
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