发明名称 Photo mask and method of manufacturing in-plane-switching mode liquid crystal display device using the same
摘要 A photo mask is disclosed. The photo mask includes a mask substrate, and a mask pattern formed to include a plurality of unit mask patterns which are arranged in a single line for a fine pattern formation. The unit mask pattern is configured to include a body portion positioned at a center and wing portions formed in a triangular shape at both sides of the body portion.
申请公布号 US8557618(B2) 申请公布日期 2013.10.15
申请号 US20090641905 申请日期 2009.12.18
申请人 KIM TAE GYUN;LG DISPLAY CO., LTD. 发明人 KIM TAE GYUN
分类号 H01L21/00 主分类号 H01L21/00
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