发明名称 |
Photo mask and method of manufacturing in-plane-switching mode liquid crystal display device using the same |
摘要 |
A photo mask is disclosed. The photo mask includes a mask substrate, and a mask pattern formed to include a plurality of unit mask patterns which are arranged in a single line for a fine pattern formation. The unit mask pattern is configured to include a body portion positioned at a center and wing portions formed in a triangular shape at both sides of the body portion.
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申请公布号 |
US8557618(B2) |
申请公布日期 |
2013.10.15 |
申请号 |
US20090641905 |
申请日期 |
2009.12.18 |
申请人 |
KIM TAE GYUN;LG DISPLAY CO., LTD. |
发明人 |
KIM TAE GYUN |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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