发明名称 Semiconductor photodetector structure and the fabrication method thereof
摘要 A semiconductor photodetector structure is provided. The structure includes a substrate, a photodetecting element and a semiconductor layer disposed on the photodetecting element. The substrate includes a first semiconductor material and includes a deep trench. The surface of the deep trench includes a first type dopant. The photodetecting element is disposed in the deep trench. The photodetecting element includes a second semiconductor material. The semiconductor layer includes a second type dopant.
申请公布号 US8558336(B2) 申请公布日期 2013.10.15
申请号 US20090542671 申请日期 2009.08.17
申请人 SU TZUNG-I;LAN BANG-CHIANG;SU CHAO-AN;WU HUI-MIN;WANG MING-I;HUANG CHIEN-HSIN;TAN TZUNG-HAN;CHEN MIN;LIN MENG-JIA;SU WEN-YU;UNITED MICROELECTRONICS CORP. 发明人 SU TZUNG-I;LAN BANG-CHIANG;SU CHAO-AN;WU HUI-MIN;WANG MING-I;HUANG CHIEN-HSIN;TAN TZUNG-HAN;CHEN MIN;LIN MENG-JIA;SU WEN-YU
分类号 H01L31/0232;H01L31/08;H01L31/18 主分类号 H01L31/0232
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