| 摘要 |
PURPOSE: A plasma processing apparatus and a plasma processing method are provided to prevent a substrate from being contaminated due to byproducts of a side space by limiting a plasma generating space using a plasma limiting member. CONSTITUTION: A chamber body(210) includes a top body(211) and a bottom body(212). A substrate support unit(220) is arranged in the chamber body and supports a substrate. A top electrode(230) is arranged in the chamber body to face the substrate support unit. A plasma limiting member(240) divides a top space between the top electrode and the substrate support unit into a plasma generating space and a side space. The plasma limiting member limits plasma in the plasma generating space and is attached to the top electrode to be electrically floated. |
