发明名称 Rubbing device and method for rubbing an alignment film
摘要 An apparatus and a method for rubbing an alignment layer are provided to improve the directivity of an ion beam applied to the alignment layer, thereby preventing rubbing failure of the alignment layer and forming alignment grooves uniformly. A gas supply unit(150) supplies an inert gas into a housing member(110). A cathode electrode(120) is inserted into and fixed onto an upper face of the housing member. An anode electrode(130), interlocked with The cathode electrode, performs plasma discharge on the inert to form an ion beam. A magnet assembly(140) forms a magnet field in The direction perpendicular to a progress direction of the ion beam to make the ion beam move straight in a direction of a substrate having an alignment layer.
申请公布号 KR101318022(B1) 申请公布日期 2013.10.14
申请号 KR20060058942 申请日期 2006.06.28
申请人 发明人
分类号 G02F1/13;G02F1/1337 主分类号 G02F1/13
代理机构 代理人
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