| 摘要 |
PURPOSE: A substrate processing apparatus is provided to precisely controlling internal pressure inside a chamber in a wide-ranging pressure condition for processing a substrate in excellent quality. CONSTITUTION: A chamber(200) processes a substrate in a secluded state from outside. The chamber includes plural pressure gauges(201-203) measuring internal pressure inside the chamber. A susceptor(300) is installed inside the chamber to be elevated. A gas sprayer(400) sprays gas to the substrate. An exhaust system(100) exhausts the inside of the chamber. The exhaust system includes a dry pump(10), a low-vacuum exhaust line(20), a middle-vacuum exhaust line(30), a first automatic pressure control valve(31), a high-vacuum exhaust line(40), a turbo-molecule pump(41), and a second automatic pressure control valve(42). |
