发明名称 SUBSTRATE STAGE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM
摘要 <p>A substrate stage for mounting a substrate thereon includes a peripheral stage member on which a peripheral substrate portion of the substrate may be mounted, the peripheral substrate portion controlling a temperature of the peripheral substrate portion, a central stage member on which a central substrate portion of the substrate may be mounted, the central substrate portion controlling a temperature of the central substrate portion, and a support base that supports the peripheral stage member and the central stage member. A gap is formed between the peripheral stage member and the central stage member to keep the peripheral stage member and the central stage member from coming in contact with each other.</p>
申请公布号 KR101317992(B1) 申请公布日期 2013.10.14
申请号 KR20110063428 申请日期 2011.06.29
申请人 发明人
分类号 H01L21/67;H01L21/68;H01L21/683 主分类号 H01L21/67
代理机构 代理人
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