发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A compound semiconductor device and a manufacturing method thereof are provided to improve pinch-off characteristics by preventing the degradation of characteristics due to a trap. CONSTITUTION: A compound semiconductor stacked structure (2) generates a 2D electron gas. An electrode is formed on the upper surface of the compound semiconductor stacked structure. The compound semiconductor stacked structure includes a p-type semiconductor layer. The p-type semiconductor layer is formed under an area where the 2D electron gas is generated. A part of the p-type semiconductor layer under the electrode includes the large amount of ionized acceptors in comparison with the other parts of the p-type semiconductor layer.
申请公布号 KR20130111289(A) 申请公布日期 2013.10.10
申请号 KR20130025106 申请日期 2013.03.08
申请人 FUJITSU LIMITED 发明人 OHKI TOSHIHIRO
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
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