| 摘要 |
<p>The present invention provides an aqueous slurry composition for use in polishing glass and glass ceramic substrates. The composition includes abrasive particles and an agent that accelerates the removal rate of glass and glass ceramic substrates. The agent that accelerates removal rate of glass and glass ceramic substrates is a zwitterionic agent that includes sulfonate group and amine group, and which has a specific molecular structure as more fully described in the specification.</p> |
