| 摘要 |
<p>A system and method to clean surfaces and components of mask and wafer inspection systems based on the positive column of a glow discharge plasma are disclosed. The surface may be the surface of an optical component in a vacuum chamber or an interior wall of the vacuum chamber. A cathode and an anode may be used to generate the glow discharge plasma. The negative glow associated with the cathode may be isolated and the positive column associated with the anode may be used to clean the optical component or the interior wall of the vacuum chamber. As such, an in situ cleaning process, where the cleaning is done within the vacuum chamber, may be performed.</p> |
