| 摘要 |
PROBLEM TO BE SOLVED: To achieve high accuracy exposure by correcting the deviation of exposure position, occurring when correcting the tilt of a table so as to reduce the slope of the resist surface.SOLUTION: The exposure device for exposing a resist on a substrate through an optical system includes a table for holding the substrate and positioning the substrate at an exposure position, an acquisition unit for acquiring the distance from an alignment mark formed on the substrate to the resist surface, and the slope of the resist surface, and a control unit for controlling the position of the table according to a correction value, calculated using the distance and slope acquired by the acquisition unit, and correcting the deviation of exposure position occurring when correcting the tilt of a table so as to reduce the slope of the resist surface. |
