HEATING ASSEMBLY AND WAFER PROCESSING APPARATUS USING THEREOF

摘要

PURPOSE: A heating member assembly and a substrate processing device including the same effectively deliver radiant energy generated from a heating member to a substrate to be heated by thinly coating the upper surface of a protective member protecting the heating member with an yttrium oxide. CONSTITUTION: A heating member (410) heats at least one substrate on a substrate support by discharging radiant energy. The heating member is composed of at least one among an optical heating member and an electric heating member. A protection member (420) transmits the radiant energy discharged from the heating member. A coating film (430) protects the protection member from process gas on a part of the protection member. The protection member includes a blocking member (422) blocking the transmission of the radiant energy discharged from the heating member and a cover member (421) covering the space of the blocking member.