发明名称 SUBSTRATE CLEANING DEVICE
摘要 PURPOSE: A substrate cleaning device including a contactless clean part is provided to prevent a substrate from being rolled by applying a guide roll part to the upper and lower surfaces of the substrate. CONSTITUTION: A bottom suction unit (140) sucks dust which is floated by a bottom cleaner (130). A guide roll part (50) is rotated around a roll axis. The guide roll part guides the substrate to pass between a top cleaner (110) and the bottom cleaner. A driving unit rotates the guide roll part. The driving unit is fixed to a frame.
申请公布号 KR20130111179(A) 申请公布日期 2013.10.10
申请号 KR20120134845 申请日期 2012.11.26
申请人 CO-MS CO., LTD. 发明人 HWANG, SUN OH
分类号 H01L21/302 主分类号 H01L21/302
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