CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a chemically amplified positive photosensitive resin composition excellent in sensitivity, development adhesiveness, UV ray resistance, heat resistance, chemical resistance, moisture absorption and a relative dielectric constant.SOLUTION: The chemically amplified positive photosensitive resin composition comprises: (A) a polymeric component including a polymer satisfying at least the following (1) or (2); (S) a siloxane oligomer having (s1) a structural unit having a crosslinking group and (s2) a structural unit having an aryl group; (B) a photoacid generator; and (D) a solvent. The polymers of (A) are: (1) a polymer having (a1) a structural unit having a residue of an acid group protected with an acid decomposable group and (a2) a structural unit having a crosslinking group; and (2) (a1) a polymer having a structural unit having a residue of an acid group protected with an acid decomposable group and (a2) a polymer having a structural unit having a crosslinking group. The content of the (s2) structural unit having an aryl group in the (S) siloxane oligomer is 35 to 95 mol%.