| 摘要 |
PROBLEM TO BE SOLVED: To provide a mass spectrometer capable of performing accurate mass analysis for an area specified by an analyzer by accurately detecting a positional deviation generated when placing a matrix-attached sample plate on a stage without using a specifically processed sample plate, and correcting the positional deviation.SOLUTION: Many fine flaws are formed on a surface of a sample plate and a pattern of flaws is different in each plate. Thereby, when a sample plate 3 is placed on a sample stage 2, an alignment reference image storage part 39 stores a microscopic observation image of a pattern of polishing flaws of a predetermined portion on the surface of the plate 3. After placing the sample plate 3 once detached from the stage 2 on the stage 2 again, a positional deviation is calculated from a difference between positions of polishing flaws in an image obtained at the time and the positions of the polishing flaws in the image stored in the storage part 39, and an analysis position correction part 24 corrects position information of the area specified by the analyzer in accordance with the found deviation. |
