| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming apparatus which can continuously form a film without causing thermal deformation of a film-shaped base material.SOLUTION: A film forming apparatus 1 includes a chamber 10, a cooling roller 13, a gas supply source 16, and a plurality of catalytic wires 17. The cooling roller 13 is rotated about a rotation axis 13a to thereby convey a film-shaped base material F wound around an outer peripheral surface 13b inside the chamber 10 while cooling it. The gas supply source 16 supplies a source gas to the base material F wound around the outer peripheral surface 13b, and is disposed facing toward the outer peripheral surface 13b. The plurality of catalytic wires 17 are installed between the outer peripheral surface 13b and the gas supply source 16 and can be heated to the decomposition temperature of the source gas. As a result, a film can be continuously formed on the base material F while the base material F is protected from the heat of the catalytic wires 17. |
