发明名称 |
MONOLITHIC INTEGRATION OF CMOS AND NON-SILICON DEVICES |
摘要 |
A method includes attaching a partially processed CMOS wafer to a second wafer to produce a combined wafer. The second wafer comprises a first region including a material different from silicon. The method also includes forming devices in the first region or in a second region of the combined wafer having a material different from silicon. |
申请公布号 |
WO2013152176(A1) |
申请公布日期 |
2013.10.10 |
申请号 |
WO2013US35249 |
申请日期 |
2013.04.04 |
申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY |
发明人 |
FITZGERALD, EUGENE, A. |
分类号 |
H01L29/66;H01L21/44;H01L21/8238 |
主分类号 |
H01L29/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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