METHOD AND DEVICE FOR APPLICATION OF AMORPHOUS SILICON FILM

摘要

The invention relates to a method and a device for application of nanosize silicon film and can be used in actual optoelectronics and integrated optics for formation of thin-film solar cells and high-capacitive storages. The method for application of amorphous silicon film is carried out by injection at pressure of nano-powder of high-pure silicon on thin movable sheet material as strip at least on one of its surface. Uniformly of film at thickness, density and composition depends from rate of strip moving and injection pressure of nano-powder. The device for application of amorphous silicon comprises the chamber and mechanism moving thin sheet material and device for injection of nano-powder at pressure placed inside the chamber. The group of the invention allows applying amorphous silicon film on large surfaces, significantly improving the effectiveness and process efficiency of film application and significantly simplifying the technology of amorphous silicon film.