<p>Methods for improving the adhesion of vacuum deposited coatings to a wide variety of substrates are described herein. The methods include utilizing a thermal source to generate free radical species which are then contacted to the substrate to be coated. Chemical vapor deposition, particularly initiated chemical vapor deposition (iCVD) can be used to form polymer thin films in situ without the need to remove the substrate from the chamber or even return to atmospheric pressure. Significant improvements in substrate adhesion of the subsequently deposited films have been observed over a range of substrate and coating materials.</p>
申请公布号
WO2013152068(A1)
申请公布日期
2013.10.10
申请号
WO2013US35065
申请日期
2013.04.03
申请人
GVD CORPORATION
发明人
GLEASON, KAREN, K.;PEERLESS, JAMES, SAMUEL;O'SHAUGHNESSY, SHANNAN, W.