发明名称 |
HIGHLY STRETCHABLE MATERIAL BEYOND INTRINSIC LIMITS USING THREE-DIMENSIONAL NANOSTRUCTURES AND ITS FABRICATION METHOD |
摘要 |
PURPOSE: A highly stretchable material is provided to offer high elasticity greater than the stretch limit of a polymer bulk material by a stress distributing effect using a 3D porous nanostructure pattern. CONSTITUTION: Nanosized pores are partially or three-dimensionally connected to a polymer material with a 3D porous nanostructure to form a channel. The nanosized pores have regular or irregular form toward each axial direction. The nanosized pores and the polymer material with the 3D porous nanostructure forms a 3D porous nanostructure pattern. The polymer material has the high elasticity which is greater than the stretch limit of a polymer bulk material. The polymer material has one property selected from a conductive material, a magnetic material, or a semiconductor. |
申请公布号 |
KR20130110659(A) |
申请公布日期 |
2013.10.10 |
申请号 |
KR20120032794 |
申请日期 |
2012.03.30 |
申请人 |
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
JEON, SEOK WOO;PARK, JUN YOUNG |
分类号 |
B82B1/00;C08J5/18;H01B1/20 |
主分类号 |
B82B1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|