发明名称 HIGHLY STRETCHABLE MATERIAL BEYOND INTRINSIC LIMITS USING THREE-DIMENSIONAL NANOSTRUCTURES AND ITS FABRICATION METHOD
摘要 PURPOSE: A highly stretchable material is provided to offer high elasticity greater than the stretch limit of a polymer bulk material by a stress distributing effect using a 3D porous nanostructure pattern. CONSTITUTION: Nanosized pores are partially or three-dimensionally connected to a polymer material with a 3D porous nanostructure to form a channel. The nanosized pores have regular or irregular form toward each axial direction. The nanosized pores and the polymer material with the 3D porous nanostructure forms a 3D porous nanostructure pattern. The polymer material has the high elasticity which is greater than the stretch limit of a polymer bulk material. The polymer material has one property selected from a conductive material, a magnetic material, or a semiconductor.
申请公布号 KR20130110659(A) 申请公布日期 2013.10.10
申请号 KR20120032794 申请日期 2012.03.30
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 JEON, SEOK WOO;PARK, JUN YOUNG
分类号 B82B1/00;C08J5/18;H01B1/20 主分类号 B82B1/00
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