| 摘要 |
PROBLEM TO BE SOLVED: To enable high-speed deposition even when performing vapor deposition of a material susceptible to degradation caused by heat load, such as an organic material, when performing vapor deposition using an evaporation source on a large-size substrate which is upright arranged in a vacuum deposition chamber.SOLUTION: A vacuum deposition device 100 includes a vapor deposition chamber 5 comprising a vacuum vessel, and an evaporation source 31 for forming a vapor deposition film on a substrate 1. The evaporation source includes an evaporation chamber 22 which stores a vapor deposition material and a nozzle 21 which injects the vapor deposition material evaporated in the evaporation chamber to the substrate. A material hopper chamber 11, which stores the vapor deposition material to be delivered to the evaporation chamber, is provided in the vapor deposition chamber, and a carrying means 68 of the vapor deposition material, which can carry the vapor deposition material 4 stored in the material hopper chamber, is attached to the material hopper chamber. The carrying means of the vapor deposition material includes an insulating member 62 at the end thereof. |
