IMAGING POSITION VARIATION DETECTING METHOD FOR PROJECTION LENS, ADJUSTMENT METHOD FOR STAGE POSITION, IMAGING POSITION VARIATION DETECTING DEVICE FOR PROJECTION LENS, ADJUSTMENT DEVICE FOR STAGE POSITION, AND PROJECTION EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To correctly image a pattern image on a workpiece even when the temperature of a photographic lens changes.SOLUTION: A pattern formed on a mask 13 is projected and exposed on a workpiece 14 on a stage 12 by a projection lens 10. At a reference time when the projection lens 10 has a predetermined temperature, a predetermined alignment mark 21 formed on the mask 13 is auto-focused and photographed by a camera 32 disposed between the projection lens and the stage. At the time of pre-exposure, which takes place before the exposure on the workpiece 14 on the stage 12, the alignment mark 21 is auto-focused and photographed by the camera 32 to obtain the amount of focus. A focus variation which is the difference between a photographic focusing position D0 at the reference time for the camera 32 and a photographic focusing position at the pre-exposure time is obtained. A variation in a pattern imaging position is obtained from the focus variation, and a position of the stage 12 in the direction of an optical axis is adjusted based on the variation.