发明名称 PZT FERROELECTRIC THIN FILM AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a PZT ferroelectric thin film capable of having high life reliability, while having dielectric characteristic equivalent to a conventional ferroelectric thin film, and a method for manufacturing the same.SOLUTION: A PZT ferroelectric thin film formed on a bottom electrode of a substrate having the bottom electrode whose crystalline plane is oriented in a (111) axial direction, comprises: an orientation control layer formed on the bottom electrode and having a film thickness whose crystal orientation is preferentially controlled on a (100) face, within a range of 45nm to 150nm; and a film thickness adjustment layer formed on the orientation control layer and having the same crystal orientation as the orientation control layer, and a boundary face is formed between the orientation control layer and the film thickness adjustment layer.
申请公布号 JP2013211328(A) 申请公布日期 2013.10.10
申请号 JP20120079194 申请日期 2012.03.30
申请人 MITSUBISHI MATERIALS CORP 发明人 NOGUCHI TAKESHI;DOI TOSHIHIRO;SAKURAI HIDEAKI;WATANABE TOSHIAKI;SOYAMA NOBUYUKI
分类号 H01L41/39;C04B35/49;C04B35/491;H01G4/10;H01G4/12;H01G4/33;H01L21/316;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L41/09;H01L41/18;H01L41/187 主分类号 H01L41/39
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