发明名称 |
PZT FERROELECTRIC THIN FILM AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a PZT ferroelectric thin film capable of having high life reliability, while having dielectric characteristic equivalent to a conventional ferroelectric thin film, and a method for manufacturing the same.SOLUTION: A PZT ferroelectric thin film formed on a bottom electrode of a substrate having the bottom electrode whose crystalline plane is oriented in a (111) axial direction, comprises: an orientation control layer formed on the bottom electrode and having a film thickness whose crystal orientation is preferentially controlled on a (100) face, within a range of 45nm to 150nm; and a film thickness adjustment layer formed on the orientation control layer and having the same crystal orientation as the orientation control layer, and a boundary face is formed between the orientation control layer and the film thickness adjustment layer. |
申请公布号 |
JP2013211328(A) |
申请公布日期 |
2013.10.10 |
申请号 |
JP20120079194 |
申请日期 |
2012.03.30 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
NOGUCHI TAKESHI;DOI TOSHIHIRO;SAKURAI HIDEAKI;WATANABE TOSHIAKI;SOYAMA NOBUYUKI |
分类号 |
H01L41/39;C04B35/49;C04B35/491;H01G4/10;H01G4/12;H01G4/33;H01L21/316;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L41/09;H01L41/18;H01L41/187 |
主分类号 |
H01L41/39 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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