发明名称 METHOD OF MEASURING A SILICON THIN FILM, METHOD OF DETECTING DEFECTS IN A SILICON THIN FILM, AND SILICON THIN FILM DEFECT DETECTION DEVICE
摘要 A method of measuring conductivity of a silicon thin film is provided. By the method, a capacitive sensor is positioned over a silicon thin film sample with an air-gap between the sensor and the sample, a size of the air-gap is measured using the capacitive sensor while an excitation light source module is turned off, an excitation light is illuminated on the silicon thin film sample by turning on the excitation light source module, where the excitation light is an ultraviolet light, a conductivity change of the silicon thin film sample is measured using the capacitive sensor, and a measurement error due to a deviation of the air-gap is eliminated by normalizing the conductivity change based on a measurement result of the size of the air-gap.
申请公布号 US2013265078(A1) 申请公布日期 2013.10.10
申请号 US201313766271 申请日期 2013.02.13
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 VORONOV ALEXANDER;LEE SEOK-HO;JUNG JI-HUNNY;HEO KYUNG-HOE;HAN GYOO-WAN
分类号 G01R31/26 主分类号 G01R31/26
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