FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To bring a mask into close contact with a substrate by eliminating a gap between the mask and the substrate so as to prevent occurrence of an unnecessary bevel-like film when the vapor deposition film of an organic EL device is formed.SOLUTION: A film deposition apparatus deposits the film of a vapor-deposition substance which is injected from a vapor deposition source through a mask, on a substrate for an organic EL device carried into a vacuum chamber. A surface opposing to the substrate of a substrate supporting means supporting the substrate perpendicularly is constituted of a curved surface projected toward the substrate side.