发明名称 COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT
摘要 Disclosed is a composition comprising a source of metal ions, one or more suppressing agents and at least one additive comprising a linear or branched, polymeric biguanide compound comprising the structural unit of formula L1 or the corresponding salt thereof, wherein R1 is independently selected from H or an organic radical having 1-20 carbon atoms; R2 is an divalent organic radical having 1-20 carbon atoms, optionally comprising 20 polymeric biguanide side branches; and n is an integer of 2 or more.
申请公布号 US2013264213(A1) 申请公布日期 2013.10.10
申请号 US201113994540 申请日期 2011.12.19
申请人 ROEGER-GOEPFERT CORNELIA;RAETHER ROMAN BENEDIKT;HOERHAMMER HARALD;MARCO ARNOLD;EMNET CHARLOTTE;MAYER DIETER;BASF SE 发明人 ROEGER-GOEPFERT CORNELIA;RAETHER ROMAN BENEDIKT;HOERHAMMER HARALD;MARCO ARNOLD;EMNET CHARLOTTE;MAYER DIETER
分类号 C25D3/38 主分类号 C25D3/38
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