| 摘要 |
<p>Cleaning devices and methods for cleaning substrates are provided. In one aspect, a cleaning device for cleaning a substrate includes a brush including an outer surface and defines a hollow bore positioned around a central axis of the brush, and nodules formed on the outer surface of the brush and each nodule includes a concave surface. Each concave surface defines an outer edge surrounding a central concavity point. In another aspect, a method for cleaning a substrate includes engaging a substrate with a cleaning device. The cleaning device includes a brush including an outer surface and defines a hollow bore positioned around a first axis of the brush, and nodules formed on the outer surface and each nodule includes a concave surface. Each concave surface defines an outer edge surrounding a central concavity point. The method also includes rotating the brush about the first axis in a first rotational direction.</p> |
