发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity and excellent volume resistivity and solvent resistance.SOLUTION: A positive photosensitive resin composition is provided, which comprises: (A) a copolymer having a structural unit (a1) having a group comprising an acid group protected with an acid decomposable group and a structural unit (a2) having a partial structure expressed by -NH-CH-O-R (where R represents an alkyl group having 1 to 20 carbon atoms); (B) a photoacid generator; and (D) a solvent.
申请公布号 JP2013210607(A) 申请公布日期 2013.10.10
申请号 JP20130004275 申请日期 2013.01.15
申请人 FUJIFILM CORP 发明人 YAMAZAKI KENTA;YONEZAWA HIROYUKI;SHIMOYAMA TATSUYA;KAWASHIMA TAKASHI;SHIMONO KATSUHIRO;YAMADA SATORU;YUMOTO MASATOSHI;ANDO TAKESHI
分类号 G03F7/039;C08F220/00;G03F7/004;G03F7/40;H01L21/027;H01L51/50;H05B33/22 主分类号 G03F7/039
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