发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity and excellent volume resistivity and solvent resistance.SOLUTION: A positive photosensitive resin composition is provided, which comprises: (A) a copolymer having a structural unit (a1) having a group comprising an acid group protected with an acid decomposable group and a structural unit (a2) having a partial structure expressed by -NH-CH-O-R (where R represents an alkyl group having 1 to 20 carbon atoms); (B) a photoacid generator; and (D) a solvent. |
申请公布号 |
JP2013210607(A) |
申请公布日期 |
2013.10.10 |
申请号 |
JP20130004275 |
申请日期 |
2013.01.15 |
申请人 |
FUJIFILM CORP |
发明人 |
YAMAZAKI KENTA;YONEZAWA HIROYUKI;SHIMOYAMA TATSUYA;KAWASHIMA TAKASHI;SHIMONO KATSUHIRO;YAMADA SATORU;YUMOTO MASATOSHI;ANDO TAKESHI |
分类号 |
G03F7/039;C08F220/00;G03F7/004;G03F7/40;H01L21/027;H01L51/50;H05B33/22 |
主分类号 |
G03F7/039 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|