发明名称 |
MANUFACTURING METHOD FOR THIN FILM TRANSISTOR ARRAY PANEL |
摘要 |
<p>PURPOSE: A method of manufacturing a thin film transistor array panel prevents the corrosion of wiring and the generation of a residual metal film by forming a thin film transistor using fluorinated gas not containing sulfur. CONSTITUTION: A gate line including a gate electrode is formed on a substrate. A gate insulating film covering the gate line is formed. A semiconductor material layer is formed on the gate insulating film. A data wiring material layer is formed on the semiconductor material layer. A first photoresist pattern is formed on the data wiring material layer. A second photoresist pattern is formed by etching back the first photoresist pattern.</p> |
申请公布号 |
KR20130110916(A) |
申请公布日期 |
2013.10.10 |
申请号 |
KR20120033254 |
申请日期 |
2012.03.30 |
申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
HWANG, JAE SEUNG;LEE, JAE WON;SEO, JUN |
分类号 |
H01L29/786;G02F1/136;H01L51/50 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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