发明名称 MANUFACTURING METHOD FOR THIN FILM TRANSISTOR ARRAY PANEL
摘要 <p>PURPOSE: A method of manufacturing a thin film transistor array panel prevents the corrosion of wiring and the generation of a residual metal film by forming a thin film transistor using fluorinated gas not containing sulfur. CONSTITUTION: A gate line including a gate electrode is formed on a substrate. A gate insulating film covering the gate line is formed. A semiconductor material layer is formed on the gate insulating film. A data wiring material layer is formed on the semiconductor material layer. A first photoresist pattern is formed on the data wiring material layer. A second photoresist pattern is formed by etching back the first photoresist pattern.</p>
申请公布号 KR20130110916(A) 申请公布日期 2013.10.10
申请号 KR20120033254 申请日期 2012.03.30
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 HWANG, JAE SEUNG;LEE, JAE WON;SEO, JUN
分类号 H01L29/786;G02F1/136;H01L51/50 主分类号 H01L29/786
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