| 摘要 |
PROBLEM TO BE SOLVED: To enable an entire surface of a substrate that includes an outer peripheral part to be evenly cleaned without increasing the use amount of cleaning water such as pure water even when the substrate is held by a substrate holder with the outer peripheral part of the surface sealed by a seal member.SOLUTION: A substrate cleaning apparatus includes: a cleaning tank 100 where a substrate holder holding the substrate with a surface outer peripheral part sealed by a seal member is vertically placed therein; a nozzle plate 104 disposed at a position in the cleaning tank 100 that faces the substrate holder 18 placed in the cleaning tank 100 and having multiple cleaning nozzles 102 jetting cleaning water toward the substrate holder 18. The multiple cleaning nozzles 102 are disposed at a contact part Dof the surface outer peripheral part contacting with the seal member or a position, which is located near the contact part Dand is exposed to jet flow, in an upper half region of the substrate so as to be arranged concentrically with the contact part D. |
