| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition source which suppresses a film in a slope state generated when forming a vapor deposition film in a vacuum deposition device.SOLUTION: In a vacuum deposition device, a vapor deposition film with a predetermined pattern is formed on a substrate via a mask. A vapor deposition source is arranged opposite to the substrate. The vapor deposition source includes a crucible, and a plurality of injection nozzles 33 which introduce a vaporized material contained in the crucible to the substrate. The injection nozzles are aligned. An upper diffusion prevention plate 31 and a lower diffusion prevention plate 32 are arranged on both sides of the row of the injection nozzles, and side diffusion prevention plates 34 are arranged between the respective injection nozzles. The vapor deposition source is moved in the vertical direction by a moving means. |
