发明名称 SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
摘要 A semiconductor structure includes first and second chips assembled to each other. The first chip includes N of first conductive lines, M of second conductive lines disposed on the first conductive lines, N of third conductive lines perpendicularly on the second conductive lines and parallel to the first conductive lines, N of first vias connected to the first conductive lines, M sets of second vias connected to the second conductive lines, and N sets of third vias connected to the third conductive lines. The second and first conductive lines form an overlapping area. The third conductive lines and N sets of the third vias include at least two groups respectively disposed in a first and a third regions of the overlapping area. M sets of second vias include at least two groups respectively disposed in a second region and a fourth region of the overlapping area.
申请公布号 US2013264719(A1) 申请公布日期 2013.10.10
申请号 US201213443496 申请日期 2012.04.10
申请人 CHEN SHIH-HUNG;HSIEH KUANG-YEU;WANG CHENG-YUAN;MACRONIX INTERNATIONAL CO., LTD. 发明人 CHEN SHIH-HUNG;HSIEH KUANG-YEU;WANG CHENG-YUAN
分类号 H01L23/522;H01L21/50 主分类号 H01L23/522
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