| 摘要 |
PURPOSE: An exposure apparatus, a method for controlling the exposure apparatus, and a method for manufacturing a device are provided to improve the accuracy of exposure by correcting the shift of an exposure position due to the correction of the tilt angle of a table. CONSTITUTION: A table holds a substrate. The substrate is placed on an exposure position by using the table. An acquisition unit acquires the tilt angle of a resist surface and the distance from a mark to the resist surface. A control unit (91) calculates a correction value for collecting the shift of the exposure position. The control unit controls the position of a table according to the correction value. [Reference numerals] (AA,BB) Scanning direction |
