发明名称 ZnO-BASED SEMICONDUCTOR LAYER, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING ZnO-BASED SEMICONDUCTOR LIGHT-EMITTING ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a novel technique for doping a ZnO-based semiconductor with Cu.SOLUTION: A method for manufacturing a ZnO-based semiconductor layer comprises: a step (a) of supplying Zn, O and, if necessary, Mg to the upper part of a base layer to form an MgZnO (0≤x≤0.6) single crystal film; and a step (b) of supplying Cu onto the MgZnO (0≤x≤0.6) single crystal film. The step (a) and the step (b) are alternately repeated to form an MgZnO (0≤x≤0.6) layer doped with Cu.
申请公布号 JP2013211513(A) 申请公布日期 2013.10.10
申请号 JP20120251010 申请日期 2012.11.15
申请人 STANLEY ELECTRIC CO LTD 发明人 KATO HIROYUKI;SAITO SENJU;SANO MICHIHIRO
分类号 H01L21/203;C23C14/08;H01L21/205;H01L21/363;H01L21/365 主分类号 H01L21/203
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