发明名称 |
ZnO-BASED SEMICONDUCTOR LAYER, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING ZnO-BASED SEMICONDUCTOR LIGHT-EMITTING ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a novel technique for doping a ZnO-based semiconductor with Cu.SOLUTION: A method for manufacturing a ZnO-based semiconductor layer comprises: a step (a) of supplying Zn, O and, if necessary, Mg to the upper part of a base layer to form an MgZnO (0≤x≤0.6) single crystal film; and a step (b) of supplying Cu onto the MgZnO (0≤x≤0.6) single crystal film. The step (a) and the step (b) are alternately repeated to form an MgZnO (0≤x≤0.6) layer doped with Cu. |
申请公布号 |
JP2013211513(A) |
申请公布日期 |
2013.10.10 |
申请号 |
JP20120251010 |
申请日期 |
2012.11.15 |
申请人 |
STANLEY ELECTRIC CO LTD |
发明人 |
KATO HIROYUKI;SAITO SENJU;SANO MICHIHIRO |
分类号 |
H01L21/203;C23C14/08;H01L21/205;H01L21/363;H01L21/365 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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