发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, AND ORGANIC EL DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition exhibiting excellent sensitivity, an excellent relative dielectric constant after cured, and excellent pattern resolution after baked.SOLUTION: The photosensitive resin composition comprises: (component A) a resin satisfying the following (1) or (2): (component B) a photoacid generator; (component C) hollow particles; and (D) a solvent. The resin is (1) an acrylic resin having (a1) a structural unit having a residue comprising an acid group protected with an acid decomposable group and (a2) a structural unit having a crosslinking group; or the resin is (2) (a1) an acrylic resin having a structural unit having a residue comprising an acid group protected with an acid decomposable group and (a2) an acrylic resin having a structural unit having a crosslinking group. |
申请公布号 |
JP2013210616(A) |
申请公布日期 |
2013.10.10 |
申请号 |
JP20130033770 |
申请日期 |
2013.02.22 |
申请人 |
FUJIFILM CORP |
发明人 |
ANDO TAKESHI |
分类号 |
G03F7/004;C08F220/10;G03F7/039;H01L51/50;H05B33/22 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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