| 发明名称 |
CHALCOGENIDE-CONTAINING PRECURSORS, METHODS OF MAKING, AND METHODS OF USING THE SAME FOR THIN FILM DEPOSITION |
| 摘要 |
Disclosed are chalcogenide-containing precursors for use in the manufacture of semiconductor, photovoltaic, LCD-TFT1 or fiat panel type devices. Also disclosed a methods of synthesizing the chalcogenide-containing precursors and vapor deposition methods, preferably thermal ALD, using the chaicogenide-containing precursors to form chaicogenide-containing films.
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| 申请公布号 |
US2013267082(A1) |
申请公布日期 |
2013.10.10 |
| 申请号 |
US201013576988 |
申请日期 |
2010.12.29 |
| 申请人 |
GATINEAU JULIEN;MINOURA MAO;ISHII HANA;L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE |
发明人 |
GATINEAU JULIEN;MINOURA MAO;ISHII HANA |
| 分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
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