发明名称 COMPOSITE SUBSTRATE AND PRODUCTION METHOD
摘要 <p>A composite substrate which includes a silicon layer having less lattice defects is provided. A composite substrate (40) includes an insulating substrate (30) and a functional layer (21) of which one main surface is bonded to an upper surface of the substrate (30). A dopant concentration of the functional layer (21) decreases from the other main surface toward the substrate (30) side in a thickness direction of the functional layer.</p>
申请公布号 EP2648210(A1) 申请公布日期 2013.10.09
申请号 EP20110845593 申请日期 2011.11.30
申请人 KYOCERA CORPORATION 发明人 KITADA, MASANOBU;OGAWA, MOTOKAZU
分类号 H01L21/02;H01L21/18;H01L21/20;H01L21/205;H01L27/12;H01L29/32 主分类号 H01L21/02
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