发明名称 SEMIPOLAR NITRIDE-BASED DEVICES ON PARTIALLY OR FULLY RELAXED ALLOYS WITH MISFIT DISLOCATIONS AT THE HETEROINTERFACE
摘要 <p>A dislocation-free high quality template with relaxed lattice constant, fabricated by spatially restricting misfit dislocation(s) around heterointerfaces. This can be used as a template layer for high In composition devices. Specifically, the present invention prepares high quality InGaN templates (In composition is around 5-10%), and can grow much higher In-composition InGaN quantum wells (QWs) (or multi quantum wells (MQWs)) on these templates than would otherwise be possible.</p>
申请公布号 EP2467872(A4) 申请公布日期 2013.10.09
申请号 EP20100810719 申请日期 2010.08.23
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 OHTA, HIROAKI;WU, FENG;TYAGI, ANURAG;CHAKRABORTY, ARPAN;SPECK, JAMES S.;DENBAARS, STEVEN P.;NAKAMURA, SHUJI;YOUNG, ERIN, C.
分类号 H01L21/20;H01L33/06;H01L33/12;H01L33/16;H01L33/32;H01S5/20;H01S5/22;H01S5/32;H01S5/343 主分类号 H01L21/20
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