发明名称 Composite Wafer for Fabrication of Semiconductor Devices
摘要 A composite wafer includes a first substrate having a first vertical thickness and a top surface, the top surface being prepared in a state for subsequent semiconductor material epitaxial deposition. A carrier substrate is disposed beneath the first substrate. The carrier substrate has a second vertical thickness greater than the first vertical thickness. An interlayer bonds the first substrate to the carrier substrate.
申请公布号 EP2605269(A3) 申请公布日期 2013.10.09
申请号 EP20120193679 申请日期 2012.11.21
申请人 POWER INTEGRATIONS, INC. 发明人 KOUDYMOV, ALEXEI;RAMDANI, JAMAL;SWAMINATHAN, KIERTHI
分类号 H01L21/20 主分类号 H01L21/20
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