发明名称 Variable resistance memory device and method of forming the same
摘要 Provided are a variable resistance memory device and a method of forming the same. The variable resistance memory device may include a substrate, a plurality of bottom electrodes on the substrate, and a first interlayer insulating layer including a trench formed therein. The trench exposes the bottom electrodes and extends in a first direction. The variable resistance memory device further includes a top electrode provided on the first interlayer insulating layer and extending in a second direction crossing the first direction and a plurality of variable resistance patterns provided in the trench and having sidewalls aligned with a sidewall of the top electrode.
申请公布号 US8552412(B2) 申请公布日期 2013.10.08
申请号 US20100973124 申请日期 2010.12.20
申请人 PARK JEONGHEE;HORII HIDEKI;PARK HYEYOUNG;OH JIN HO;KWON HYUN-SUK;SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK JEONGHEE;HORII HIDEKI;PARK HYEYOUNG;OH JIN HO;KWON HYUN-SUK
分类号 H01L45/00 主分类号 H01L45/00
代理机构 代理人
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