发明名称 |
Variable resistance memory device and method of forming the same |
摘要 |
Provided are a variable resistance memory device and a method of forming the same. The variable resistance memory device may include a substrate, a plurality of bottom electrodes on the substrate, and a first interlayer insulating layer including a trench formed therein. The trench exposes the bottom electrodes and extends in a first direction. The variable resistance memory device further includes a top electrode provided on the first interlayer insulating layer and extending in a second direction crossing the first direction and a plurality of variable resistance patterns provided in the trench and having sidewalls aligned with a sidewall of the top electrode. |
申请公布号 |
US8552412(B2) |
申请公布日期 |
2013.10.08 |
申请号 |
US20100973124 |
申请日期 |
2010.12.20 |
申请人 |
PARK JEONGHEE;HORII HIDEKI;PARK HYEYOUNG;OH JIN HO;KWON HYUN-SUK;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK JEONGHEE;HORII HIDEKI;PARK HYEYOUNG;OH JIN HO;KWON HYUN-SUK |
分类号 |
H01L45/00 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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