发明名称 A CAPACITOR AND A MEHTOD OF FORMING THE SAME
摘要 PURPOSE: A capacitor and a forming method thereof prevent bridges between lower electrodes of the capacitors by forming the uniform thickness of a reflectionless coating layer. CONSTITUTION: A first conductive layer, a dielectric film, a second conductive layer, and a hard mask are formed on a substrate (10). A hard mask pattern (50A) and an upper electrode (40A) having sloped side walls are formed by etching the hard mask and the first conductive layer. A spacer (60A) is formed on each of the sloped side walls of the hard mask pattern and the upper electrode. A lower electrode (20A) is formed by etching the dielectric film and the second conductive layer. Each of the sloped side walls of the hard mask pattern and the upper electrode is 45 to 85°.
申请公布号 KR20130109626(A) 申请公布日期 2013.10.08
申请号 KR20120031518 申请日期 2012.03.28
申请人 DONGBU HITEK CO., LTD. 发明人 SHIN, DONG WON
分类号 H01L21/8242;H01L27/108 主分类号 H01L21/8242
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