发明名称 Masking method
摘要 The invention relates to a method for masking a semiconductor substrate including the following steps: providing a planar semiconductor substrate having a first side and a second side lying opposite thereto, applying a mask to at least one of the sides, an extrusion printing method being used for applying the mask.
申请公布号 US8551883(B2) 申请公布日期 2013.10.08
申请号 US20100815598 申请日期 2010.06.15
申请人 NEUHAUS HOLGER;KRAUSE ANDREAS;BITNAR BERND;BAMBERG FREDERICK;SCHLOSSER REINHOLD;SOLARWORLD INNOVATIONS GMBH 发明人 NEUHAUS HOLGER;KRAUSE ANDREAS;BITNAR BERND;BAMBERG FREDERICK;SCHLOSSER REINHOLD
分类号 H01L21/308;H01L31/068 主分类号 H01L21/308
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