发明名称 Semiconductor device
摘要 There is a problem that a reverse off-leak current becomes too large in a Schottky barrier diode. A semiconductor device of the present invention includes P-type first and second anode diffusion layers formed in an N-type epitaxial layer, N-type cathode diffusion layers formed in the epitaxial layer, a P-type third anode diffusion layer formed in the epitaxial layer so as to surround the first and second anode diffusion layers and to extend toward the cathode diffusion layers, and a Schottky barrier metal layer formed on the first and second anode diffusion layers.
申请公布号 US8552469(B2) 申请公布日期 2013.10.08
申请号 US20070862585 申请日期 2007.09.27
申请人 KIKUCHI SHUICHI;OKAWA SHIGEAKI;NAKAYA KIYOFUMI;TANAKA SHUJI;SANYO SEMICONDUCTOR CO., LTD.;SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC 发明人 KIKUCHI SHUICHI;OKAWA SHIGEAKI;NAKAYA KIYOFUMI;TANAKA SHUJI
分类号 H01L29/66;H01L29/47 主分类号 H01L29/66
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